The Laboratory of Micromechanics of Materials

Group			Publications	Project Overview	Facility
X-Ray Diffraction MoCVD and RESS In-Field Processing N-T CVD Production Magnetic Processing CVD CVD Reaction System Assembled Micro-nanofabrication Characterization

X-Ray Diffraction	PANalytical X’Pert PRO Alpha-1, PANalytical X’Pert PRO MPD, PANalytical X’Pert PRO MPD X-ray Analysis Group at GATech
MoCVD and RESS Facility	Metal-organic Chemical Vapor Deposition (MOCVD) and supercritical fluid extraction and the rapid expansion of supercritical fluid solutions (RESS), techniques were applied for the preparation of: Granular Cu-Co films Thin films of LSMO, LCMO Nano-Tubes Nano-powders of Co, Ni,..(2-4nm diameter)
Chemical Vapor Deposition for In-Field Processing	In-field & 0-field Processing (1200C) Thin film Nano-tubes
Prototype for Nano-Tube CVD Production	Scale bar: 500nm, HV: 200KV, TEM Mag: 50000X Scale bar: 100nm, HV: 200KV, TEM Mag: 150000X Scale bar: 5nm, HV: 200KV, TEM Mag: 1200000X
Magnetic Processing	The sample was left to cure at 25 °C under 25 T field for 2 hrs to keep the viscosity as low as possible. v Then the furnace was heated up to 60 C° and the sample is left to cure under the magnet field for another 2 hours. After then the magnetic field was reduced to 0 Tesla, the samples were placed in another furnace at 60° C for another 2 hours to fully cure. v The experiment was repeated at 15 Tesla field with same magnetic processing and curing cycles as before.
Chemical Vapor Deposition
CVD Reaction
System Assembled	PL: Plasma chamber, SCF: super critical fluid, RC: reaction Chamber, COL: Collector
Micro-nanofabrication	Variety of Micro/nanofabrication facilities for physical and chemical deposition such as PECVD, Atomic Layer Deposition (ALD), etc. available at Georgia Tech Microelectronics Research Center (Institute for Electronics and Nanotechnology: http://cleanroom.ien.gatech.edu/
Characterization	* Characterization facilities available at Georgia Tech Microelectronics Research Center (Institute for Electronics and Nanotechnology: http://cleanroom.ien.gatech.edu/ - Field-Emission Scanning Electron Microscopy (SEM/EDS) (Zeiss Ultra60 FE-SEM) - Focused Ion Beam (FIB) (FEI Quanta, FEI Nova) - Atomic Force Microscopy (AFM) * Georgia Tech Center for Nanostructure Characterization and Fabrication: http://cncf.nanoscience.gatech.edu/ - Transmission Electron Microscopy (JEOL 4000EX, JEOL 100 CX)