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MoCVD and RESS facility

 

Metal-organic Chemical Vapor Deposition (MOCVD) and supercritical fluid extraction and the rapid expansion of supercritical fluid solutions (RESS), techniques were applied for the preparation of:

  • Granular Cu-Co films

  • Thin films of LSMO, LCMO

  • Nano-Tubes

  • Nano-powders of Co, Ni,..(2-4nm diameter)

 

 

Chemical Vapor Deposition for in-Field
Processing

 

 

 

 

 

 

 

 

 

Furnace

 

In-field
&
0-field Processing
(1200C)
Thin film
Nano-tubes..

 

 

 

 

 

 

 

 

 

 

 

 

Prototype For Nano-tube CVD
Production

 

 

 

 

 

 

 

 

 

 

 

Scale bar: 500nm, HV: 200KV,
TEM Mag: 50000X

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

Scale bar: 100nm, HV: 200KV,
TEM Mag: 150000X

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

Scale bar: 5nm, HV: 200KV, TEM
Mag: 1200000X

 

 

 

 

 

 

 

 

 

 

 

 

Magnetic Processing

 

 

 

 

 

 

  • The sample was left to cure at 25 °C under 25 T field for 2 hrs to keep the viscosity
    as low as possible.

  • v Then the furnace was heated up to 60 C° and the sample is left to cure under the
    magnet field for another 2 hours. After then the magnetic field was reduced to 0
    Tesla, the samples were placed in another furnace at 60° C for another 2 hours to
    fully cure.

  • v The experiment was repeated at 15 Tesla field with same magnetic processing and
    curing cycles as before.

 

Chemical Vapor Deposition

 

 

 

 

 

CVD Reaction

 

 

 

 

System assembled

 

PL: Plasma chamber, SCF: super critical fluid, RC: reaction
Chamber, COL: Collector

 

 

Particles