Group
X-Ray Diffraction
MoCVD and RESS
In-Field Processing
N-T CVD Production
Magnetic Processing
CVD
CVD Reaction
System Assembled
Micro-nanofabrication
Characterization
X-Ray Diffractionxray4xray3

PANalytical X’Pert PRO Alpha-1, PANalytical X’Pert PRO MPD, PANalytical X’Pert PRO MPD

X-ray Analysis Group at GATech
MoCVD and RESS Facility


Metal-organic Chemical Vapor Deposition (MOCVD) and supercritical fluid extraction and the rapid expansion of supercritical fluid solutions (RESS), techniques were applied for the preparation of:

  • Granular Cu-Co films

  • Thin films of LSMO, LCMO

  • Nano-Tubes

  • Nano-powders of Co, Ni,..(2-4nm diameter)



Chemical Vapor Deposition for In-Field Processing

In-field & 0-field Processing (1200C) Thin film Nano-tubes
Prototype for Nano-Tube CVD Production


Scale bar: 500nm, HV: 200KV,
TEM Mag: 50000X



Scale bar: 100nm, HV: 200KV,
TEM Mag: 150000X




Scale bar: 5nm, HV: 200KV, TEM
Mag: 1200000X


Magnetic Processing



  • The sample was left to cure at 25 C under 25 T field for 2 hrs to keep the viscosity
    as low as possible.

  • v Then the furnace was heated up to 60 C and the sample is left to cure under the
    magnet field for another 2 hours. After then the magnetic field was reduced to 0
    Tesla, the samples were placed in another furnace at 60 C for another 2 hours to
    fully cure.

  • v The experiment was repeated at 15 Tesla field with same magnetic processing and
    curing cycles as before.


Chemical Vapor Deposition

CVD Reaction

System Assembled


PL: Plasma chamber, SCF: super critical fluid, RC: reaction
Chamber, COL: Collector

Micro-nanofabricationVariety of Micro/nanofabrication facilities for physical and chemical deposition such as PECVD, Atomic Layer Deposition (ALD), etc. available at Georgia Tech Microelectronics Research Center (Institute for Electronics and Nanotechnology: http://cleanroom.ien.gatech.edu/
Characterization* Characterization facilities available at Georgia Tech Microelectronics Research Center (Institute for Electronics and Nanotechnology: http://cleanroom.ien.gatech.edu/
- Field-Emission Scanning Electron Microscopy (SEM/EDS) (Zeiss Ultra60 FE-SEM)
- Focused Ion Beam (FIB) (FEI Quanta, FEI Nova)
- Atomic Force Microscopy (AFM)
* Georgia Tech Center for Nanostructure Characterization and Fabrication: http://cncf.nanoscience.gatech.edu/
- Transmission Electron Microscopy (JEOL 4000EX, JEOL 100 CX)